Fabrication of smooth 45° micromirror using TMAH low concentration solution with NCW-601A surfactant on 100 silicon

Fabrication of smooth 45° micromirror using TMAH low concentration solution with NCW-601A surfactant on ‹100› silicon

著者名:

Y. W. Xu ( Univ. of New South Wales, Australia )
A. Michael ( Univ. of New South Wales, Australia )
C. Y. Kwok ( Univ. of New South Wales, Australia )

掲載資料名:

Device and process technologies for microelectronics, MEMS, photonics, and nanotechnology IV : 5-7 December 2007, Canberra, Australia

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6800

発行年:

2008

開始ページ:

68001W-1

終了ページ:

68001W-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469717 [0819469718]

言語:

英語

請求記号:

P63600/6800

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052431
シリーズID:	PA00000029
会議名:	Smart Materials, Nano-, and Micro- Smart Systems : Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology
回次:	2007 : 4th
会議開催地:	Canberra, Australia
会議開催年:	2007.12.05-2007.12.07
論文注記:	Device and process technologies for microelectronics, MEMS, photonics, and nanotechnology IV, 5-7 December 2007, Canberra, Australia - Poster Session (6800-76)

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