Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials

Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials

著者名:

A. Klukowska ( micro resist technology GmbH, Germany )
M. Vogler ( micro resist technology GmbH, Germany )
A. Kolander ( micro resist technology GmbH, Germany )
F. Reuther ( micro resist technology GmbH, Germany )
G. Gruetzner ( micro resist technology GmbH, Germany )

掲載資料名:

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6792

発行年:

2008

開始ページ:

67920J-1

終了ページ:

67920J-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469564 [0819469564]

言語:

英語

請求記号:

P63600/6792

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052423
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : EMLC
回次:	2008 : 24th
会議開催地:	Dresden, Germany
会議開催年:	2008.01.21-2008.01.24
論文注記:	24th European Mask and Lithography Conference : EMLC2008, 21-24 January 2008, Dresden, Germany - Resist (6792-22)

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