Key improvement schemes of accuracies in EB mask writing for double patterning lithography

Key improvement schemes of accuracies in EB mask writing for double patterning lithography

著者名:

H. Sunaoshi ( NuFlare Technology, Inc., Japan )
T. Kamikubo ( NuFlare Technology, Inc., Japan )
R. Nishimura ( NuFlare Technology, Inc., Japan )
K. Tsuruta ( NuFlare Technology, Inc., Japan )
T. Katsumata ( NuFlare Technology, Inc., Japan )

掲載資料名:

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6792

発行年:

2008

開始ページ:

679208-1

終了ページ:

679208-7

総ページ数:

7

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469564 [0819469564]

言語:

英語

請求記号:

P63600/6792

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052423
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : EMLC
回次:	2008 : 24th
会議開催地:	Dresden, Germany
会議開催年:	2008.01.21-2008.01.24
論文注記:	24th European Mask and Lithography Conference : EMLC2008, 21-24 January 2008, Dresden, Germany - Mask Business and Mask Data Prep (6792-11)

類似資料:

1 国際会議録 Coping with double-patterning/exposure lithography by EB mask writer EBM-6000 T. Kamikubo, R. Nishimura, K. Tsuruta, K. Hattori, J. Takamatsu Society of Photo-optical Instrumentation Engineers	7 国際会議録 Improvement of position accuracy in mask-writing electron beam lithography with a multi-pass writing strategy for reducing position errors due to resist … N. Kobayashi, K. Goto, T. Wakatsuki, T. Komagata, Y. Nakagawa Society of Photo-optical Instrumentation Engineers
2 国際会議録 Study of heating effect on CAR in electron-beam mask writing T. Kamikubo, M. Hiramoto, J. Yashima, M. Takahashi, R. Nishimura, T. Katsumata, H. Anze, H. Sunaoshi, S. Tamamushi, M. … SPIE - The International Society of Optical Engineering	8 国際会議録 Advanced electron-beam writing system EX-11 for next-generation mask fabrication Tojo, T., Yoshikawa, R., Ogawa, Y., Tamamushi, S., Hattori, Y., Koikari, S., Kusakabe, H., Abe, T., Ogasawara, M., … SPIE - The International Society of Optical Engineering
3 国際会議録 Writing accuracy of EBM-3500 electron-beam mask writing system Ohtoshi,K., Sunaoshi,H., Takamatsu,J., Okabe,F., Ishibashi,K., Yoshitake,S., Yamada,H., Tamamushi,S., Anze,H., … SPIE-The International Society for Optical Engineering	9 国際会議録 Wafer based mask characterization for double patterning lithography R. de Kruif, K. Bubke, G.-J. Janssen, E. van der Heijden, J. Fochler Society of Photo-optical Instrumentation Engineers
4 国際会議録 EBM-5000: electron-beam mask writer for 45 nm node [6283-04] Sunaoshi, H., Tachikawa, Y., Higurashi, H., Iijima, T., Suzuki, J., Kamikubo, T., Ohtoshi, K., Anze, H., Katsumata, T., … SPIE - The International Society of Optical Engineering	10 国際会議録 Electron-beam mask writer EBM-6000 for 45 nm HP node J. Yashima, K. Ohtoshi, N. Nakayamada, H. Anze, T. Katsumata, T. Iijima, R. Nishimura, S. Fukutome, N. Miyamoto, S. … SPIE - The International Society of Optical Engineering
5 国際会議録 Mask characterization for double patterning lithography K. Bubke, E. Cotte, J. H. Peters, R. de Kruif, M. Dusa Society of Photo-optical Instrumentation Engineers	11 国際会議録 Stage tracking of a mask-scan EB mask writer test stand Nishimura,S., Mitsui,S., Ogasawara,M., Akeno,K., Shimizu,M., Kusakabe,H., Wada,H., Hattori,K., Yoshitake,S., … SPIE-The International Society for Optical Engineering
6 国際会議録 Modeling of charging effect and its correction by EB mask writer EBM-6000 N. Nakayamada, S. Wake, T. Kamikubo, H. Sunaoshi, S. Tamamushi Society of Photo-optical Instrumentation Engineers	12 国際会議録 Improvement of beam-adjustment accuracy by beam-intensity distribution measurement on a second shaping aperture in electron-beam writing systems Nishimura,S., Ogasawara,M., Tojo,T. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12