Wafer based mask characterization for double patterning lithography

Wafer based mask characterization for double patterning lithography

著者名:

R. de Kruif ( ASML Netherlands B.V., Netherlands )
K. Bubke ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
G.-J. Janssen ( ASML Netherlands B.V., Netherlands )
E. van der Heijden ( ASML Netherlands B.V., Netherlands )
J. Fochler ( Toppan Photomasks, Inc., Germany )

掲載資料名:

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6792

発行年:

2008

開始ページ:

679204-1

終了ページ:

679204-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469564 [0819469564]

言語:

英語

請求記号:

P63600/6792

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052423
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : EMLC
回次:	2008 : 24th
会議開催地:	Dresden, Germany
会議開催年:	2008.01.21-2008.01.24
論文注記:	24th European Mask and Lithography Conference : EMLC2008, 21-24 January 2008, Dresden, Germany - Double Patterning (6792-07)

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