UV-NIL template for the 22nm node and beyond

UV-NIL template for the 22nm node and beyond

著者名:

T. Hiraka ( Dai Nippon Printing Co., Ltd., Japan )
S. Yusa ( Dai Nippon Printing Co., Ltd., Japan )
A. Fujii ( Dai Nippon Printing Co., Ltd., Japan )
S. Sasaki ( Dai Nippon Printing Co., Ltd., Japan )
K. Itoh ( Dai Nippon Printing Co., Ltd., Japan )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

3

開始ページ:

67305P-1

終了ページ:

67305P-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Poster session: Imprint (6730-210)

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