Resistless mask structuring using an ion multi-beam projection pattern generator

Resistless mask structuring using an ion multi-beam projection pattern generator

著者名:

J. Butschke ( IMS Chips, Germany )
M. Irmscher ( IMS Chips, Germany )
F. Letzkus ( IMS Chips, Germany )
H. Loeschner ( IMS Nanofabrication AG, Austria )
L. Nedelmann ( IMS Chips, Germany )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

3

開始ページ:

673047-1

終了ページ:

673047-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Poster session: Patterning (6730-148)

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2 国際会議録 Resistless Patterning of Magnetic Storage Media Using Ion Projection Structuring Dietzel, A., Berger, R., Grimm, H., Schug, C., Bruenger, W.H., Dzionk, C., Letzkus, F., Springer, R., Loeschner, H., … Materials Research Society	8 国際会議録 IPI stencil mask distortions:experimental and theoretical analysis Ehrmann,A., Struck,T., Haugeneder,E., Loschner,H., Butschke,J., Letzkus,F., Irmscher,M., Springer,R. SPIE - The International Society for Optical Engineering
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4 国際会議録 Patterning of Ta/Si02 high transmission EAPSM material for 193nm technology [5853-26] Koepernik, C., Becker, H. W., Butschke, J., Buttgereit, U., Irmscher, M., Nedelmann, L., Schmidt, F., Teuber, S. SPIE - The International Society of Optical Engineering	10 国際会議録 NIL template manufacturing using a variable. shaped e-beam writer and a new pCAR [6151-42] Irmscher, M., Butschke, J., Hess, G., Koepernik, C., Letzkus, F., Renno, M., Sailer, H., Schulz, H., Schwersenz, A., … SPIE - The International Society of Optical Engineering
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6 国際会議録 Placement measurement and FE modeling results for distortion control of stencil masks Ehrmann,A., Struck,T., Kaesmaier,R., Haugeneder,E., Loschner,H., Butschke,J., Letzkus,F., Irmscher,M., Springer,R., … SPIE - The International Society for Optical Engineering	12 国際会議録 Comparative evaluation of e-beam sensitive chemically amplifild resists for mask making Irmscher, M., Beyer, D., Butschke, J., Constantine, C., Hoffmann, T., Koepernik, C., Krauss, C., Leibold, B., Letzkus, … SPIE-The International Society for Optical Engineering

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