A generic technique for reducing OPC iteration: fast forward OPC

A generic technique for reducing OPC iteration: fast forward OPC

著者名:

L. Hong ( Mentor Graphics Corp., USA )
J. Sturtevant ( Mentor Graphics Corp., USA )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

2

開始ページ:

67302M-1

終了ページ:

67302M-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 17. RET I (6730-187)

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1 国際会議録 Exposure tool specific post-OPC verification J. Sturtevant, S. Jayaram, L. Hong Society of Photo-optical Instrumentation Engineers	7 国際会議録 Assist feature OPC implementation for the 130-nm technology node with KrF and no forbidden pitches Word, J.C., Zhu, S., Sturtevant, J.L. SPIE-The International Society for Optical Engineering
2 国際会議録 Novel method for optimizing lithography exposure conditions using full-chip post-OPC simulation J. Sturtevant, S. Jayaram, L. Hong, A. Drozdov Society of Photo-optical Instrumentation Engineers	8 国際会議録 SEM-contour-based OPC model calibration through the process window J. Vasek, O. Menedeva, D. Levitzky, O. Lindman, Y. Nemadi, G. E. Bailey, J. L. Sturtevant SPIE - The International Society of Optical Engineering
3 国際会議録 Impact of illumination source symmetrization in OPC J. L. Sturtevant, L. Hong, S. Jayaram, S. P. Renwick, M. McCallum Society of Photo-optical Instrumentation Engineers	9 国際会議録 Assessing the impact of real world manufacturing lithography variations on post-OPC CD control Sturtevant, J. L., Word, J., LaCour, P., Park, J. W., Smith, D. SPIE - The International Society of Optical Engineering
4 国際会議録 Optimizing gate layer OPC correction and SRAF placement for maximum design manufacturability T. Brist, L. Hong, A. Yehia, T. Tawfik, S. Shang, K. Sakajiri, J. L. Sturtevant SPIE - The International Society of Optical Engineering	10 国際会議録 Toward faster OPC convergence: advanced analysis for OPC iterations and simulation environment M. Bahnas, M. Al-Imam, T. Tawfik Society of Photo-optical Instrumentation Engineers
5 国際会議録 Considerations for the use of defocus models for OPC Sturtevant, J. L., Torres, J. A., Word, J., Granik, Y., LaCour, P. SPIE - The International Society of Optical Engineering	11 国際会議録 Impact of process variation on 65nm across-chip Iinewidth variation [6156-64] Hong, L., Brist, T., LaCour, P., Sturtevant, J., Niehoff, M., Niedermaier, P. SPIE - The International Society of Optical Engineering
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