Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning
- 著者名:
- A. van Oosten ( ASML Netherlands B.V., Netherlands )
- P. Nikolsky ( ASML Netherlands B.V., Netherlands )
- J. Huckabay ( Cadence Design Systems, USA )
- R. Goossens ( ASML MaskTools Inc., USA )
- R. Naber ( Cadence Design Systems, USA )
- 掲載資料名:
- Photomask technology 2007
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6730
- 発行年:
- 2007
- 巻:
- 1
- 開始ページ:
- 67301L-1
- 終了ページ:
- 67301L-7
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- 言語:
- 英語
- 請求記号:
- P63600/6730
- 資料種別:
- 国際会議録
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