Mask characterization for double patterning lithography

Mask characterization for double patterning lithography

著者名:

K. Bubke ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
E. Cotte ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
J. H. Peters ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
R. de Kruif ( ASML Netherlands B.V., Netherlands )
M. Dusa ( ASML US, Inc., USA )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

1

開始ページ:

67301H-1

終了ページ:

67301H-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 12. Extreme NA (6730-52)

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1 国際会議録 Wafer based mask characterization for double patterning lithography R. de Kruif, K. Bubke, G.-J. Janssen, E. van der Heijden, J. Fochler Society of Photo-optical Instrumentation Engineers	7 国際会議録 Double patterning for 32nm and below: an update J. Finders, M. Dusa, B. Vleeming, H. Megens, B. Hepp Society of Photo-optical Instrumentation Engineers
2 国際会議録 Metrology challenges of double exposure and double patterning W. H. Arnold, M. Dusa, J. Flinders SPIE - The International Society of Optical Engineering	8 国際会議録 Mask image position correction for double patterning lithography M. Saito, M. Itoh, O. Ikenaga, K. Ishigo Society of Photo-optical Instrumentation Engineers
3 国際会議録 Pellicle-induced aberrations and apodization in hyper NA optical lithography [6283-115] Bubke, K., Alles, B, Cotte, E., Sczyrba, M., Pierrat, C. SPIE - The International Society of Optical Engineering	9 国際会議録 Study of stress birefringence for 1 93-nm immersion photomasks [5853-02] Cotte, E., Selle, M., Bubke, K., Teuber, S. SPIE - The International Society of Optical Engineering
4 国際会議録 Pitch doubling through dual-patterning lithography challenges in integration and litho budgets M. Dusa, J. Quaedackers, O. F. A. Larsen, J. Meessen, E. van der Heijden, G. Dicker, O. Wismans, P. de Haas, K. van I. … SPIE - The International Society of Optical Engineering	10 国際会議録 CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques Vandenberghe,G., Marschner,T., Ronse,K., Socha,R.J., Dusa,M.V. SPIE - The International Society for Optical Engineering
5 国際会議録 Coping with double-patterning/exposure lithography by EB mask writer EBM-6000 T. Kamikubo, R. Nishimura, K. Tsuruta, K. Hattori, J. Takamatsu Society of Photo-optical Instrumentation Engineers	11 国際会議録 Image degradation due to phase effects in chromeless phase lithography [6349-38] Bubke, K., Sczyrba, M., Park, K. T., Neubauer, R., Pforr, R., Reichelt, J., Ziebold, R. SPIE - The International Society of Optical Engineering
6 国際会議録 Key improvement schemes of accuracies in EB mask writing for double patterning lithography H. Sunaoshi, T. Kamikubo, R. Nishimura, K. Tsuruta, T. Katsumata Society of Photo-optical Instrumentation Engineers	12 国際会議録 Optimal mask characterization by Surrogate Wafer Print (SWaP) method K. R. Kimmel, I. Hoellein, J. H. Peters, P. Ackmann, B. Connolly Society of Photo-optical Instrumentation Engineers

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