Silicon-verified automatic DFM layout optimization: a calibration-lite model-based application to standard cells
- 著者名:
- K.-K. Lin ( Chartered Semiconductor Manufacturing, Inc., USA )
- B. P. Wong ( Chartered Semiconductor Manufacturing, Inc., USA )
- F. A. J. M. Driessen ( Takumi Technology Corp., USA )
- E. Morita ( Takumi Technology Corp., USA )
- S. Klaver ( Takumi Technology Corp., USA )
- 掲載資料名:
- Photomask technology 2007
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6730
- 発行年:
- 2007
- 巻:
- 1
- 開始ページ:
- 67300X-1
- 終了ページ:
- 67300X-9
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- 言語:
- 英語
- 請求記号:
- P63600/6730
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
DFM viewpoints of cell-level layout assessments and indications for concurrent layout optimization
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |