Litho-aware extraction for the 32nm double patterning node

Litho-aware extraction for the 32nm double patterning node

著者名:

J. Huckabay ( Cadence Design Systems, Inc., USA )
Q. Chen ( Cadence Design Systems, Inc., USA )
C. Thayer ( Cadence Design Systems, Inc., USA )
R. Naber ( Cadence Design Systems, Inc., USA )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

1

開始ページ:

67300W-1

終了ページ:

67300W-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 8. DFM 3: Modal aware design and optimization (6730-32)

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1 国際会議録 Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning A. van Oosten, P. Nikolsky, J. Huckabay, R. Goossens, R. Naber Society of Photo-optical Instrumentation Engineers	7 国際会議録 Double patterning overlay and CD budget for 32 nm technology node U. Iessi, S. Loi, A. Salerno, P. Rigolli, E. De Chiara Society of Photo-optical Instrumentation Engineers
2 国際会議録 Process window and interlayer aware OPC for the 32-nm node M. Terry, G. Zhang, G. Lu, S. Chang, T. Aton, R. Soper, M. Mason, S. Best, B. Dostalik, S. Hunsche, J. W. Li, R. Zhou, … SPIE - The International Society of Optical Engineering	8 国際会議録 Double patterning design split implementation and validation for the 32nm node M. Drapeau, V. Wiaux, E. Hendrickx, S. Verhaegen, T. Machida SPIE - The International Society of Optical Engineering
3 国際会議録 Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36] Huckabay, J., Staud, W., Naber, R., van Oosten, A., Nikolski, P., Hsu, S., Socha, R. J., Dusa, M. V., Flagello, D. SPIE - The International Society of Optical Engineering	9 国際会議録 Double patterning for 32nm and below: an update J. Finders, M. Dusa, B. Vleeming, H. Megens, B. Hepp Society of Photo-optical Instrumentation Engineers
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5 国際会議録 45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning H. Dai, C. Bencher, Y. Chen, H. Woo, C. Ngai Society of Photo-optical Instrumentation Engineers	11 国際会議録 Preliminary methodology investigation of mask pattern fidelity for 250-nm design rules T.P. Coleman, C.A. Sauer, R.J. Naber, H.C. Hamaker Society of Photo-optical Instrumentation Engineers
6 国際会議録 Phenomena and OPC solution of ripple patterns for 65-nm node Lai, C.-M., Ho, J.-S., Lai, C.-W., Tsai, C.-K., Tsay, C.-S., Chen, J.-H., Liu, R.-G., Ku, Y.C., Lin, B.-J. SPIE - The International Society of Optical Engineering	12 国際会議録 PMJ 2007 panel discussion overview: double exposure and double patterning for 32-nm half-pitch design node Y. Nagaoka, H. Watanabe Society of Photo-optical Instrumentation Engineers

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