The impact of mask photoresist develop on critical dimension parameters

The impact of mask photoresist develop on critical dimension parameters

著者名:

A. C. Smith ( IBM System and Technology Group, USA )
D. B. Sullivan ( IBM System and Technology Group, USA )
K. Sugawara ( Toppan Electronics Inc., USA )
Y. Okawa ( Toppan Electronics Inc., USA )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

1

開始ページ:

67300L-1

終了ページ:

67300L-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 5. Resist (6730-20)

類似資料:

1 国際会議録 Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists [6349-05] Sullivan, D., Okawa, Y., Sugawara, K., Benes, Z., Kotani, J. SPIE - The International Society of Optical Engineering	7 国際会議録 The impact of attenuated phase shift mask topography on hyper-NA lithography [5992-36] Mack, C. A., Smith, M. D., Graves, T. SPIE - The International Society of Optical Engineering
2 国際会議録 Comparisons of critical parameters for high- and low-activation-energy deep-UV photoresists Conley,W., Babcock,C.P., Farrar,N.R., Liu,H.-Y., Peterson,B., Taira,K. SPIE-The International Society for Optical Engineering	8 国際会議録 Post coat delay effects on chemically amplified resists and storage condition impacts [5922-21] Sullivan, D. B., Tacette, K. C., Barrett, M. J., Couture, R. B. SPIE - The International Society of Optical Engineering
3 国際会議録 Mask critical dimension error on optical lithography Eom,T.-S., Koo,S.-S., Paek,S.-W., Kim,H.-B., Ahn,C.-N., Baik,K.-H. SPIE - The International Society for Optical Engineering	9 国際会議録 Improved ion implantation masking through photoresist fluorination [6153-110] Montgomery, P. K., Peters, R. D., Garza, C., Breeden, T., Azrak, M., Jiang, J., Kim, K. SPIE - The International Society of Optical Engineering
4 国際会議録 Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists Prabhu, V.M., Wang, M.X., Jablonski, E.L., Vogt, B.D., Lin, E.K., Wu, W.-L., Goldfarb, D.L., Angelopoulos, M., Ito, H. SPIE - The International Society of Optical Engineering	10 国際会議録 The lithographic impact of resist model parameters Smith, M.D., Byers, J.D., Mack, C.A. SPIE - The International Society of Optical Engineering
5 国際会議録 The impact of illumination on feature fidelity for CPL mask technology Kuijten, J. P., Verhappen, A., Conley, W., van de Goor, S., Litt, L., Wu, W., Lucas, K., Roman, B., Kasprowicz, B., … SPIE - The International Society of Optical Engineering	11 国際会議録 Photoresist Polymer Mask Formed from Aqueous Phase Via Polymerization in a Two-Dimensional Surfactant Template Newman, P. D., Newman, G. K., Harwell, J. H. MRS - Materials Research Society
6 国際会議録 Critical parameters for parallel interconnects using VCSEL arrays and fiber image guides(Invited Paper) Mukherjee, S.D., Hadley, G.R., Geib, K.M., Choquette, K.D., Carter, T.R., Fischer, A.J., Robinson, M., Sullivan, C.T. SPIE-The International Society for Optical Engineering	12 国際会議録 The impact of mask topography on binary reticles at the 65-nm node Smith, M. D., Byers, J. D., Mack, C. A. SPIE - The International Society of Optical Engineering

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