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Tantalum Nitride for Copper Diffusion Blocking on Thin Film (BiSb)2Te3

著者名:
  • H.H. Hsu ( Industrial Technology Research Institute, Taiwan, R.O.C. )
  • C.H. Cheng ( National Taiwan Normal University, Taiwan, R.O.C. )
  • C.K. Lin ( Industrial Technology Research Institute, Taiwan, R.O.C. )
  • K.Y. Chen
  • Y.L. Lin
掲載資料名:
Thermoelectric materials research and device development for power conversion and refrigeration : symposium held November 25-30, 2012, Boston, Massachusetts, U.S.A
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
1490
発行年:
2013
開始ページ:
145
終了ページ:
150
総ページ数:
6
出版情報:
Warrendale, Pa: Materials Research Society
ISSN:
02729172
ISBN:
9781605114675 [1605114677]
言語:
英語
請求記号:
M23500/1490
資料種別:
国際会議録

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