Thermal Stability of Low Resistance Ohmic Contacts Between Ti and Se-Passivated n-Type Si(001)

Thermal Stability of Low Resistance Ohmic Contacts Between Ti and Se-Passivated n-Type Si(001)

著者名:

掲載資料名:

Interfaces in electronic materials : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2003-31

発行年:

2003

開始ページ:

316

終了ページ:

325

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774253 [156677425X]

言語:

英語

請求記号:

E23400/200331

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00051857
シリーズID:	PA00000028
会議名:	Symposium on Interfaces in Electronic Materials ; Joint Annual Meetings of the Electrochemical Society and the Electronics Division of the American Ceramic Society
回次:	2003
会議開催地:	Orlando, FL
会議開催年:	2003.10.12-2003.10.16

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