The Reliability Evaluation of Thin Silicon Dioxide Using the Stepped Current TYDDB Technique
- 著者名:
- 掲載資料名:
- Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, amd Thin Insulator Materials
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 1993-25
- 発行年:
- 1993
- 開始ページ:
- 390
- 終了ページ:
- 399
- 総ページ数:
- 10
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770675 [156677067X]
- 言語:
- 英語
- 請求記号:
- E23400/940140
- 資料種別:
- 国際会議録
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