Poly(glycidyl methacrylate-block-styrene) for Photolithographically Patternable Resist Materials

Poly(glycidyl methacrylate-block-styrene) for Photolithographically Patternable Resist Materials

著者名:

掲載資料名:

Progress in controlled radical polymerization : materials and applications

シリーズ名:

ACS symposium series

シリーズ巻号:

1101

発行年:

2012

開始ページ:

115

終了ページ:

126

総ページ数:

12

出版情報:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841227569 [084122756X]

言語:

英語

請求記号:

A05800/1101

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00051820
シリーズID:	PA00000004
回次:	2011
会議開催地:	Denver, Colorado, USA
会議開催年:	2011.08.28-2011.09.01

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