Reliability of Oxide Thin Film Transistors Under the Gate Bias Stress with 400 nm Wavelength Light Illumination
- 著者名:
Soo-Yeon Lee Sun-Jae Kim Yongwook Lee Woo-Geun Lee Kap-Soo Yoon Jang-Yeon Kwon Min-Koo Han - 掲載資料名:
- Amorphous and polycrystalline thin-film silicon science and technology--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 1321
- 発行年:
- 2012
- 開始ページ:
- 253
- 終了ページ:
- 258
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781605112985 [1605112984]
- 言語:
- 英語
- 請求記号:
- M23500/1321
- 資料種別:
- 国際会議録
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11
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Gate Overlapped Lightly Doped Drain Poly-Si TFTs Employing 45° Tilt Implant for Source and Drain
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