Deposition Profile Control of Carbon Films on Patterned Substrates Using a Hydrogen-Assited Plasma CVD Method

Deposition Profile Control of Carbon Films on Patterned Substrates Using a Hydrogen-Assited Plasma CVD Method

著者名:

Takuya Nomura

掲載資料名:

Microelectromechanical systems--materials and devices III : symposium held November 30-December 2, 2009, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1222

発行年:

2010

開始ページ:

203

終了ページ:

208

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605111957 [1605111953]

言語:

英語

請求記号:

M23500/1222

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00050328
シリーズID:	PA00000011
会議名:	MRS Fall Meeting
回次:	2010
会議開催地:	Boston, Massachusetts, U.S.A.
会議開催年:	2009.11.30-2010.12.02

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