Blank Cover Image

Role of Phosphoric Acid in Copper Electrochemical Mechanical Planarization Slurries

著者名:
Serdar Aksu  
掲載資料名:
Science and technology of chemical mechanical planarization (CMP) : symposium held April 14-16, 2009, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
1157
発行年:
2010
開始ページ:
139
終了ページ:
146
総ページ数:
8
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605111308 [1605111309]
言語:
英語
請求記号:
M23500/1157
資料種別:
国際会議録

類似資料:

Sainio, C., Diquette, D.J.

Electrochemical Society

S. Aksu, I. Emesh, C. Uzoh, B. Basol

Electrochemical Society

Liu, J., King, M., Darsillo, M., Baum, T.

Electrochemical Society

R. Jia, Y. Wang, Z. Wang, S. Tsai, J. Dma, D. Mao, L. Karuppiah, L. Chen

Electrochemical Society

Kuiry, S.C., Seal, S.

Electrochemical Society

Ein-Eli, Y., Abelev, E., Starosvetsky, D.

Electrochemical Society

Kuiry, S., Deshpande, S., Obeng, Y., Seal, S.

Electrochemical Society

Sainio, C.A., Duquette, D.J.

Electrochemical Society

Bum Soo Kim, Caitlin Kilroy, Stephen P. Beaudoin

American Institute of Chemical Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12