Electrical and structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering

Electrical and structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering

著者名:

掲載資料名:

Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics--2009 : symposium held April 14-17, 2009, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1156

発行年:

2009

開始ページ:

59

終了ページ:

64

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605111292 [1605111295]

言語:

英語

請求記号:

M23500/1156

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00049468
シリーズID:	PA00000011
会議名:	MRS Spring Meeting
回次:	2009
会議開催地:	San Francisco, California, USA
会議開催年:	2009.04.14-2009.04.17

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