Defects in HfO₂-Based Dielectric Gate Stacks
- 著者名:
- 掲載資料名:
- CMOS gate-stack scaling--materials, interfaces and reliability implications : symposium held April 14-16, 2009, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 1155
- 発行年:
- 2009
- 開始ページ:
- 3
- 終了ページ:
- 14
- 総ページ数:
- 12
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781605111285 [1605111287]
- 言語:
- 英語
- 請求記号:
- M23500/1155
- 資料種別:
- 国際会議録
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6
国際会議録
Instability and Defects in Gate Dielectric: Similarity and Differences Between Hf-Stacks and SiO2
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