Phosphorus and Boron Doping Effect on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-phase Silicon Thin Films

Phosphorus and Boron Doping Effect on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-phase Silicon Thin Films

著者名:

Chunsheng Jiang

掲載資料名:

Amorphous and polycrystalline thin-film silicon science and technology--2009 : symposium held April 14-17, 2009, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1153

発行年:

2009

開始ページ:

345

終了ページ:

352

総ページ数:

8

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605111261 [1605111260]

言語:

英語

請求記号:

M23500/1153

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00049465
シリーズID:	PA00000011
会議名:	MRS Spring Meeting
回次:	2009
会議開催地:	San Francisco, California, USA
会議開催年:	2009.04.14-2009.04.17

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