Three-Dimensional Holographic Lithography Using a Spatial Light Modulator

Three-Dimensional Holographic Lithography Using a Spatial Light Modulator

著者名:

掲載資料名:

20th International Conference on Design Theory and Methodology : 2nd International Conference on Micro- and Nanosystems : presented at [the] 2008 ASME International Design Engineering Technical Conferences and Computers and Information in Engineering Conference, August 3-6, 2008, New York City, New York, USA

シリーズ名:

ASME Symposia Volumes

シリーズ巻号:

DETC 2008(4)

発行年:

2008

巻:

4

ペーパー番号:

DETC2008-50067

開始ページ:

783

終了ページ:

787

総ページ数:

5

出版情報:

New York: American Society of Mechanical Engineers

ISBN:

9780791843284 [0791843289]

言語:

英語

請求記号:

A11633/2008

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00049395
シリーズID:	PA00000270
会議名:	International Conference on Design Theory and Methodology ; International Conference on Micro- and Nanosystems
回次:	20th ; 2nd
会議開催地:	New York City, New York, USA
会議開催年:	2008.08.03-08.06

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