TiAlN Films Deposited by AC Reactive Magnetron Sputtering

TiAlN Films Deposited by AC Reactive Magnetron Sputtering

著者名:

G.C. Vandross ( University of Arkansas, Fayetteville, AR )
H.H. Abu-Safe ( University of Arkansas, Fayetteville, AR )
K. Abu-Shgair ( AI-Balqa University, Salt, Jordan )
M.H. Gordon ( University of Arkansas, Fayetteville, AR )

掲載資料名:

51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL

シリーズ名:

Annual Technical Conference of Society of Vacuum Coaters

シリーズ巻号:

51

発行年:

2008

開始ページ:

635

終了ページ:

638

総ページ数:

4

出版情報:

Albuquerque, NM: Society of Vacuum Coaters

ISSN:

07375921

言語:

英語

請求記号:

A63930/51

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00049388
シリーズID:	PA00000013
会議名:	Society of Vacuum Coaters. Annual technical conference
回次:	2008 : 51th
会議開催地:	Chicagom, IL, USA
会議開催年:	2008.04.19-2008.04.24

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