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Ion Flux Measurements in a Remote High Rate Depositing Plasma Using a Pulse Shape Capacitive Probe

著者名:
  • M.C. Petcu ( Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands )
  • A.C. Bronneberg ( Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands )
  • M.A. Blauw ( Holst Centre, Eindhoven, The Netherlands )
  • M. Creatore ( Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands )
  • M.C.M. van de Sanden ( Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands )
掲載資料名:
51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
51
発行年:
2008
開始ページ:
593
終了ページ:
597
総ページ数:
5
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/51
資料種別:
国際会議録

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