Optical Studies in a Deep Reactive Ion Etching (DRIE) System
- 著者名:
- S.P. Koirala ( University of Arkansas, Fayetteville, AR )
- I.U. Abhulimen ( University of Arkansas, Fayetteville, AR )
- M.H. Gordon ( University of Arkansas, Fayetteville, AR )
- H. Abu-Safe ( University of Arkansas, Fayetteville, AR )
- S.L. Burkett ( University of Arkansas, Fayetteville, AR )
- 掲載資料名:
- 51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL
- シリーズ名:
- Annual Technical Conference of Society of Vacuum Coaters
- シリーズ巻号:
- 51
- 発行年:
- 2008
- 開始ページ:
- 527
- 終了ページ:
- 530
- 総ページ数:
- 4
- 出版情報:
- Albuquerque, NM: Society of Vacuum Coaters
- ISSN:
- 07375921
- 言語:
- 英語
- 請求記号:
- A63930/51
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
MRS-Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Characterization and Modeling of Wafer and Die Level Uniformity in Deep Reactive Ion Etching (DRIE)
Materials Research Society |
Electrochemical Society |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
MRS - Materials Research Society |
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |