Reactive Film Growth of TiN by Using High Power Impulse Magnetron Sputtering (HIPIMS)
- 著者名:
J. Böhlmark ( Chemfilt Ionsputtering AB, Linköping, Sweden and Plasma & Coatings Physics, IFM Material Physics, Linköping University, Linköping, Sweden ) M. Lattemann ( Plasma & Coatings Physics, IEM Material Physics, Linköping University, Linköping, Sweden ) H. Stranning ( Plasma & Coatings Physics, IFM Material Physics, Linköping University, Linköping, Sweden and AB Sandvik Tooling, Stockholm, Sweden ) T. Selinder ( AB Sandvik Tooling, Stockholm, Sweden ) J. Carlsson ( Chemfilt lonsputtering AB, Linköping, Sweden ) U. Helmersson ( Plasma & Coatings Physics, IFM Material Physics, Linköping University, Linköping, Sweden ) - 掲載資料名:
- 49th annual technical conference proceedings, April 22-27, 2006, Washington, D.C.
- シリーズ名:
- Annual Technical Conference of Society of Vacuum Coaters
- シリーズ巻号:
- 49
- 発行年:
- 2006
- 開始ページ:
- 334
- 終了ページ:
- 337
- 総ページ数:
- 4
- 出版情報:
- Albuquerque, NM: Society of Vacuum Coaters
- ISSN:
- 07375921
- 言語:
- 英語
- 請求記号:
- A63930/49
- 資料種別:
- 国際会議録
類似資料:
Society of Vacuum Coaters |
Materials Research Society |
2
国際会議録
High Power Impulse Magnetron Sputtering (HIPIMS) Pre-treatment for the Deposition of Hard Coatings
Society of Vacuum Coaters |
Materials Research Society |
Society of Vacuum Coaters |
9
国際会議録
Growth of TiO₂ Thin Films on Si(001) and SiO₂ by Reactive High Power Impulse Magnetron Sputtering
Materials Research Society |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
Society of Vacuum Coaters | |
Society of Vacuum Coaters |
Society of Vacuum Coaters |