The High Power Impulse Magnetron Sputtering Discharge: The Ionization Mechanism
- 著者名:
- J.T Gudmundsson ( Science Institute and Department of Electrical and Computer Engineering, University of. Iceland, Reykiavik, Iceland )
- 掲載資料名:
- 49th annual technical conference proceedings, April 22-27, 2006, Washington, D.C.
- シリーズ名:
- Annual Technical Conference of Society of Vacuum Coaters
- シリーズ巻号:
- 49
- 発行年:
- 2006
- 開始ページ:
- 329
- 終了ページ:
- 333
- 総ページ数:
- 5
- 出版情報:
- Albuquerque, NM: Society of Vacuum Coaters
- ISSN:
- 07375921
- 言語:
- 英語
- 請求記号:
- A63930/49
- 資料種別:
- 国際会議録
類似資料:
Society of Vacuum Coaters |
Society of Vacuum Coaters |
2
国際会議録
Growth of TiO₂ Thin Films on Si(001) and SiO₂ by Reactive High Power Impulse Magnetron Sputtering
Materials Research Society |
Society of Vacuum Coaters |
Materials Research Society |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
12
国際会議録
Deposition Flux Characteristics near the Substrate in High Power Impulse Magnetron Sputtering
Society of Vacuum Coaters |