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Deposition of Silicon Oxide Films onto 3D Geometries by Plasma Enhanced CVD

著者名:
  • A. Bieder ( Swiss Federal Institute of Technology (ETH) Zurich, Zurich, Switzerland )
  • A. Sonnenfeld ( Swiss Federal Institute of Technology (ETH) Zurich, Zurich, Switzerland )
  • B. Borer ( Swiss Federal Institute of Technology (ETH) Zurich, Zurich, Switzerland )
  • Ph. Rudolf von Rohr ( Swiss Federal Institute of Technology (ETH) Zurich, Zurich, Switzerland )
掲載資料名:
48th annual technical conference proceedings, April 23-28, 2005, Denver, Colorado
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
48
発行年:
2005
開始ページ:
438
終了ページ:
443
総ページ数:
6
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/48
資料種別:
国際会議録

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