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Industrial Implementation of Plasma Deposition Using the Expanding Thermal Plasma Technique

著者名:
M.C.M. van de Sanden ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
P.J. van den Oever ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
M. Creatore ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
M. Schaepkens ( General Electric Global Research Center, Schenectady, New York )
T. Miebach ( General Electric Global Research Center, Schenectady, New York )
C.D. Iacovangelo ( General Electric Global Research Center, Schenectady, New York )
R.C.M. Bosch ( OTB Engineering B.V., Eindhoven, The Netherlands )
M. Bijker ( OTB Engineering B.V., Eindhoven, The Netherlands )
M. Evers ( OTB Engineering B.V., Eindhoven, The Netherlands )
D.C. Schram ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
W.M.M. Kessels ( Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands )
さらに 6 件
掲載資料名:
47th annual technical conference proceedings, April 24-29, 2004, Dallas, Texas
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
47
発行年:
2004
開始ページ:
447
終了ページ:
454
総ページ数:
8
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/47
資料種別:
国際会議録

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