Blank Cover Image

Optical and Compositional Analysis of Annealed SiOx Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

著者名:
  • T. Roschuk ( Centre for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Ontario, Canada )
  • J. Wojcik ( Centre for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Ontario, Canada )
  • R Mascher ( Centre for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Ontario, Canada )
掲載資料名:
47th annual technical conference proceedings, April 24-29, 2004, Dallas, Texas
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
47
発行年:
2004
開始ページ:
362
終了ページ:
367
総ページ数:
6
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/47
資料種別:
国際会議録

類似資料:

1 国際会議録 The Influence of the Deposition Conditions on the Optical and Compositional Characteristics of SiOx Thin Films Deposited by ECR-PECVD

J. Wojcik, P. Mascher

Society of Vacuum Coaters
7 国際会議録 Effect of Aging on Stress in Silicon Nitride Films by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition Technique.

Sah, R.E., Baumann, H., Serries, D., Kiefer, R., Braunstein, J.

Electrochemical Society
2 国際会議録 Electron Cyclotron Resonance Plasma Enhanced Chemical Vapour Depo- sition (ECR-PECVD): A Versatile Tool in the Fabrication of Optoelectronic Devices

Wojcik, J., Mascher, P.

Electrochemical Society
8 国際会議録 Thermal Stability of a-C:F,H Films Deposited by Electron Cyclotron-Resonance Plasma Enhanced Chemical Vapor Deposition

Theil, Jeremy A., Mertz, Francoise, Yairi, Micah, Seaward, Karen, Ray, Gary, Kooi, Gerrit

MRS - Materials Research Society
3 国際会議録 Composition and Mechanical Properties of Sill-con Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma-Enhanced Chemi-cal Vapor Deposition …

Sah, R.E., Baumann, H., Ohle, T.

Electrochemical Society
9 国際会議録 Wet Etching Studies on Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapor Deposited Silicon Nitride Films

Sundaram, K.B., Sah, R.E., Balachandran, K.

Electrochemical Society
4 国際会議録 Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Valade, L., deCaro, D., Casellas, H., Basso-Bert, M., Faulmann, C., Legros, I-P., Gassoux, P., Aries, L.

Electrochemical Society
10 国際会議録 Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

Panepucci,R.R., Diniz,J.A., Carli,E., Tatschi,P.J., Swart,J.W.

SPIE-The International Society for Optical Engineering
5 国際会議録 Silicon nanocrystal formation in silicon-rich silicon oxide thin films

Roschuk, T. R., Wojcik, J., Irving, E. A., Flynn, M., Mascher, P.

SPIE - The International Society of Optical Engineering
11 国際会議録 Growth of Er doped Si films by electron cyclotron resonance plasma enhanced chemical vapor deposition

Rogers, Jim L., Varhue, Walter J., Adams, Edward

MRS - Materials Research Society
6 国際会議録 A Study on the Behavior of Water Absorption of SiOF Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition Method

Kim, S.P., Choi, S.K., Park, Youngsoo, Chung, Ilsub

Materials Research Society
12 国際会議録 Composition Dependence of Room-Temperature 1.54-ｦﾌm Er3+ Luminescence From Erbium-Doped silicon:Oxygen Thin Films Deposited by Electron Cyclotron Resonance …

Shin, Jung H., Kim, Mun-Jun, Seo, Se-Young, Lee, Choochon

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12