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Carbon Thin Film Deposition Using High Power Pulsed Magnetron Sputtering

著者名:
B.M. DeKoven ( Intevac, Inc., Santa Clara, CA, )
P.R. Ward ( Intevac, Inc., Santa Clara, CA, )
R.E. Weiss ( Intevac, Inc., Santa Clara, CA, )
D.J. Christie ( Advanced Energy Industries, Inc., Fort Collins, CO )
R.A. Scholl ( Advanced Energy Industries, Inc., Fort Collins, CO )
W.D. Sproul ( Advanced Energy Industries, Inc., Fort Collins, CO )
F. Tomasel ( Advanced Energy Industries, Inc., Fort Collins, CO )
A. Anders ( Lawrence Berkeley National Laboratory, Berkeley, CA )
さらに 3 件
掲載資料名:
46th annual technical conference proceedings, March 3-8, 2003, San Francisco, California
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
46
発行年:
2003
開始ページ:
158
終了ページ:
168
総ページ数:
11
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/46
資料種別:
国際会議録

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