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Initial Capability of New Photomask-Blank Deposition Tool

著者名:
M.D. Kriese ( Osmic Inc, Auburn Hills, MI )
J.L. Wood ( Osmic Inc, Auburn Hills, MI )
J.R. Rodriguez ( Osmic Inc, Auburn Hills, MI )
G. Fournier ( Osmic Inc, Auburn Hills, MI )
D.L. Thompson ( Rohwedder Inc., Oviedo, FL )
D. Mercer ( Rohwedder Inc., Oviedo, FL )
J.A. Gass ( Rohwedder Inc., Oviedo, FL )
D.E. Mauldin ( Rohwedder Inc., Oviedo, FL )
さらに 3 件
掲載資料名:
46th annual technical conference proceedings, March 3-8, 2003, San Francisco, California
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
46
発行年:
2003
開始ページ:
143
終了ページ:
148
総ページ数:
6
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/46
資料種別:
国際会議録

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