Quality and Growth Rate of Hot-wire Chemical Vapor Deposition Epitaxial Si Layers
- 著者名:
Charles W Teplin Ina T. Martin Kim M. Jones David Young Manuel J. Romero Robert C. Reedy Howard M. Branz Paul Stradins - 掲載資料名:
- Amorphous and polycrystalline thin-film silicon science and technology--2008 : symposium held March 25-28, 2008, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 1066
- 発行年:
- 2008
- 開始ページ:
- 285
- 終了ページ:
- 292
- 総ページ数:
- 8
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781605110363 [1605110361]
- 言語:
- 英語
- 請求記号:
- M23500/1066
- 資料種別:
- 国際会議録
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