MW plasma enhanced CVD of intrinsic Si for thin film solar cells
- 著者名:
Bas B. Van Aken Hans Leegwater Maarten Dorenkamper Camile Devilee Jochen Loffler Maurits C.R. Heijna Wim J. Soppe - 掲載資料名:
- Amorphous and polycrystalline thin-film silicon science and technology--2008 : symposium held March 25-28, 2008, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 1066
- 発行年:
- 2008
- 開始ページ:
- 67
- 終了ページ:
- 74
- 総ページ数:
- 8
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781605110363 [1605110361]
- 言語:
- 英語
- 請求記号:
- M23500/1066
- 資料種別:
- 国際会議録
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12
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EFFECTIVNESS OF CVD THIN FILM BACKSIDE GETTERING AND ITS INTERACTION WITH INTRINSIC GETTERING
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