Vadim A. Soloshonok, Hisanori Ueki, Trevor K. Ellis
American Chemical Society
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David B. Berkowitz, Kannan R. Karukurichi, Roberto de la Salud-Bea, Gourhari Maiti, Jill M. McFadden, Michelle L. Morris
American Chemical Society
|
Yasufumi Ohfune, Kazuhiko Sakaguchi, Tetsuro Shinada
American Chemical Society
|
Yasuhiro Yamashita, Shū Kobayashi
American Chemical Society
|
Masanobu Yatagai, Takayuki Hamada, Hiroyuki Nozaki, Shinji Kuroda, Kenzo Yokozeki, Kunisuke Izawa
American Chemical Society
|
Lijin Xu, Ki Hung Lam, Jiwu Ruan, Qinghua Fan, Albert S. C. Chan
American Chemical Society
|
Hideo Shimizu, Izuru Nagasaki, Noboru Sayo, Takao Saito
American Chemical Society
|
S.A. Kirillov, I.V. Romanova, I.A. Farbun
Springer
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Rafael Chinchílla, Carmen Nájera
American Chemical Society
|
Masakatsu Shibasaki, Motomu Kanai
American Chemical Society
|
Zanda, Matteo, Bravo, Pierfrancesco, Volonterio, Alessandro
American Chemical Society
|
Daniel Hsieh, Steve S.Y. Wang, Lin Dong, Xuebao Wang, Christopher Wood
American Institute of Chemical Engineers
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