Extensive Study of the Correlation between Contact Etch Stop Nitride film Properties and Negative Bias Temperature Instabilities Measured in pMOSFETS

Extensive Study of the Correlation between Contact Etch Stop Nitride film Properties and Negative Bias Temperature Instabilities Measured in pMOSFETS

著者名:

D. Benoit

掲載資料名:

Silicon nitride, silicon dioxide, and emerging dielectrics 9

シリーズ名:

ECS transactions

シリーズ巻号:

6(3)

発行年:

2007

開始ページ:

355

終了ページ:

370

総ページ数:

16

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775526 [1566775523]

言語:

英語

請求記号:

E23400/6-3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047127
シリーズID:	PA00000034
会議名:	Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics ; Meeting of The Electrochemical Society
回次:	9th ; 211th
会議開催地:	Chicago, IL, USA
会議開催年:	2007.05.06-2007.05.11

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