Structural and Electrical Properties of High Pressure Hydrogen Post-Annealed Pt-Er Alloy Metal Gate on HfO2 Film | 東京工業大学附属図書館文献データベース

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Structural and Electrical Properties of High Pressure Hydrogen Post-Annealed Pt-Er Alloy Metal Gate on HfO2 Film

著者名:

さらに 4 件

掲載資料名:

Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment

シリーズ名:

ECS transactions

シリーズ巻号:

6(1)

発行年:

2007

開始ページ:

295

終了ページ:

302

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775502 [1566775507]

言語:

英語

請求記号:

E23400/6-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047125
シリーズID:	PA00000034
会議名:	International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS ; Meeting of the Electrochemical Society
回次:	3rd ; 211th
会議開催地:	Chicago, IL, USA
会議開催年:	2007.05.06-2007.05.10

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