The Low Leakage Current Density of MIS with SiO₂ Film Made by ICP-CVD
- 著者名:
- 掲載資料名:
- Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 2(1)
- 発行年:
- 2006
- 開始ページ:
- 261
- 終了ページ:
- 266
- 総ページ数:
- 6
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566774383 [1566774381]
- 言語:
- 英語
- 請求記号:
- E23400/2-1
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
MRS - Materials Research Society |
2
国際会議録
Optically Transparent of N-ZnO/p-NiO Heterojunction for Ultraviolet Photodetector Application
Trans Tech Publications |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
MRS - Materials Research Society |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
Electrochemical Society |
MRS-Materials Research Society |
12
国際会議録
Two Step O2/N2O Plasma Annealing for the Reduction of Leakage Current in Amorphous Ta2O5 Films
MRS - Materials Research Society |