Chemical Mechanical Polishing of SiCOH-Based Low-k Dielectrics | 東京工業大学附属図書館文献データベース

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Chemical Mechanical Polishing of SiCOH-Based Low-k Dielectrics

著者名:

さらに 6 件

掲載資料名:

Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing

シリーズ名:

ECS transactions

シリーズ巻号:

2(1)

発行年:

2006

開始ページ:

227

終了ページ:

236

総ページ数:

10

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774383 [1566774381]

言語:

英語

請求記号:

E23400/2-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047106
シリーズID:	PA00000034
会議名:	International Symposium on Dielectrics for Nanosystems ; Meeting of the Electrochemical Society
回次:	2nd ; 209th
会議開催地:	Denver, Colorado. USA
会議開催年:	2004.05.07-2004.05.12

類似資料:

1 国際会議録 Low-Dielectric Constant SiCOH Films as Potential Candidates for Interconnect Dielectrics Cohen, S., Grill, A., Jahnes, C., Patel, V., Perraud, L. Materials Research Society	7 国際会議録 Characterization of the Chemical Effects of Ceria Slurries for Chemical Mechanical Polishing Abiade, J.T., Yeruva, S., Moudgil, B., Kumar, D., Singh, R.K. Materials Research Society
2 国際会議録 Study on Chemical-Mechanical Polishing of Low Dielectric Constant Polyimide Thin Films Tai, Y.L., Tsai, M.S., Tung, I.C., Dai, B.T., Feng, M.S. Electrochemical Society	8 国際会議録 CHEMICAL-MECHANICAL POLISHING OF TUNGSTEN WITH HOLOGEN-BASED SLURRIES Yang, K., Gutmann, R. J., Murarka, S. P., Stonebaker, E., Atkins, H. MRS - Materials Research Society
3 国際会議録 The Intercorrelation Between Microstructure and Chemical-Mechanical Polish of Metal Thin Films Tseng, W-T., Wang, Y-L. MRS - Materials Research Society	9 国際会議録 CHARACTERIZATION OF CHEMICAL-MECHANICAL POLISHING DIELECTRICS FOR MULTILEVEL METALLIZATION Sun, S. C., Yeh, F. L., Tien, H. Z. MRS - Materials Research Society
4 国際会議録 A Quantitative Model for Oxide Erosion in Chemical Mechanical Polishing of Tungsten Yoon, B.U., Jeong, I.K, Kim, J.Y., Lee, J.W., Hah, S.R., Moon, J.T., Lee, S.I. Electrochemical Society	10 国際会議録 Porous Low-k Dielectrics: Material Properties Tyberg, C., Huang, E., Hedrick, J., Simonyi, E., Gates, S., Cohen, S., Malone, K., Wickland, H., Sankarapandian, M., … American Chemical Society
5 国際会議録 Material Characterization and Chemical-Mechanical Polishing of Low-Dielectric Constant Fluorinated Silicon Dioxide Films Tseng, Wei-Tsu, Lin, Charles C.-F., Hsieh, Yuan-Tsu, Feng, M.-S. MRS - Materials Research Society	11 国際会議録 Evaluation of pad life in chemical mechanical polishing process using statistical metrology Muthukrishnan,N.M., Prasad,S., Stine,B.E., Loh,W., Nagahara,R., Chung,J.E., Boning,D.S. SPIE-The International Society for Optical Engineering
6 国際会議録 Comparison of Mechanical and Chemomechanical Polished SiC Wafers Using Photon Backscattering Mitchel, W. C., Brown, J., Buckanan, D., Bertke, R., Malalingham, K., Orazio, F. D. Jr., Pirouz, P., Tseng, H. -J. R., … Trans Tech Publications	12 国際会議録 Tribological Experiments Applied to Tungsten Chemical- Mechanical Polishing Agarwal, P., Bielmann, M., Lolt, D., Mahajan, U., Mischler, S., Rosset, E., Singh, R. K. Materials Research Society

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