Influence of Deposition Temperature of Atomic-Layer-Deposited HfO₂ Films on Interfacial Chemical Structure and Interface Trap Density
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28 Growth and characterization of Al2O3:HfO2 nanolaminate films deposited by Atomic Layer Deposition
Electrochemical Society |
Electrochemical Society | |
Electrochemical Society | |
Electrochemical Society |
Electrochemical Society |