High-k Materials in Flash Memories | 東京工業大学附属図書館文献データベース

Blank Cover Image

High-k Materials in Flash Memories

著者名:

さらに 11 件

掲載資料名:

Physics and technology of high-k gate dielectrics III

シリーズ名:

ECS transactions

シリーズ巻号:

1(5)

発行年:

2006

開始ページ:

91

終了ページ:

106

総ページ数:

16

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774444 [1566774446]

言語:

英語

請求記号:

E23400/1-5

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047099
シリーズID:	PA00000034
会議名:	International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues
回次:	3rd
会議開催地:	Los Angeles, California, USA
会議開催年:	2005.10.16-2005.10.21

類似資料:

1 国際会議録 Structural and Chemical Investigation of Annealed Al₂O₃ Films for Interpoly Dielectric Application in Flash Memories A. Piagge, M. Caniatti, A. Del Vitto, C. Wiemer, G. Pavia, S. Alberici, E. Bellandi, A. Nale, M. Alessandri Electrochemical Society	7 国際会議録 Optical Characterisation of High-? Materials Deposited by ALCVD Bellandi, E., Crivelli, B., Elbaz, A., Alessandri, M., Boher, P., Defranoux, C. Electrochemical Society
2 国際会議録 A Morphological, Chemical and Electrical Study of HfSiON Films for Inter Poly Dielectric Applications in Flash Memories A. Del Vitto, R. Piagge, M. Caniatti, C. Wiemer, G. Pavia Electrochemical Society	8 国際会議録 SCANNING CAPACITANCE FORCE MICROSCOPY AND KELVIN PROBE FORCE MICROSCOPY OF NANOSTRUCTURES EMBEDDED IN SiO2 Tallarida, G., Spiga, S., Fanciulli, M. Kluwer Academic Publishers
3 国際会議録 Physical-Chemical Evolution of Hf-Aluminates Upon Thermal Treatments Crivelli, B., Alessandri, M., Alberici, S., Brazzelli, D., Elbaz, A. C., Frabboni, S., Ghidini, G., Maes, J. W., … Materials Research Society	9 国際会議録 Electrical Characterization of Highly Reliable 80Å Oxide Ghidini, G., Alessandri, M., Clementi, C., Drera, D. Electrochemical Society
4 国際会議録 Crystallization Behavior of Hf-Rich Aluminates and Influence on Film Dielectric Properties Climent, M., Crivelli, B., Righini, G., Alberici, S., Alessandri, M., Elbaz, A.C., Pavia, G., Wiemer, C. Materials Research Society	10 国際会議録 Ultrathin NO/N2O oxynitride dielectric for advanced flash memory application: Single wafer and batch technology Zonca, R., Crivelli, B., Polignano, M. L., Cazzaniga, F., Alessandri, M., Caricato, A. P., Bersani, M., Sbetti, M., … MRS-Materials Research Society
5 国際会議録 Physical-Chemical Evolution Upon Thermal Treatments of Al2O3, HfO2 and Al/Hf Composite Materials Deposited by ALCVDTM Crivelli, B., Alessandri, M., Alberici, S., Cazzaniga, F., Dekadjevi, D., Maes, J.W., Ottaviani, G., Pavia, G., … Materials Research Society	11 国際会議録 Precursor combinations for ALD of rare earth oxides and silicates-A quantum chemical and x-ray study Elliott, S. D., Scarel, G., Wiemer, C., Fanciulli, M., Lebedinskii, Y., Zenkevich, A., Fedushkin, I. L. Electrochemical Society
6 国際会議録 Optical Characterisation of High-? Materials Deposited by ALCVD Bellandi, E., Crivelli, B., Elbaz, A., Alessandri, M., Boher, P., Defranoux, C. SPIE-The International Society for Optical Engineering	12 国際会議録 EFFICIENCY OF OZONE DISSOLUTION INTO AMBIENT TEMPERATURE RINSE BATHS Wolke, K., Schenkl, M., Alessandri, M., Bellandi, E. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12