SINGLE - WAFER WET CLEANING FOR A HIGH PARTICLE REMOVAL EFFICIENCY ON HYDROPHOBIC SURFACE | 東京工業大学附属図書館文献データベース

SINGLE - WAFER WET CLEANING FOR A HIGH PARTICLE REMOVAL EFFICIENCY ON HYDROPHOBIC SURFACE

著者名:

K. Sano

掲載資料名:

Cleaning Technology in Semiconductor Device Manufacturing IX

シリーズ名:

ECS transactions

シリーズ巻号:

1(3)

発行年:

2006

開始ページ:

134

終了ページ:

141

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774291 [1566774292]

言語:

英語

請求記号:

E23400/1-3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047097
シリーズID:	PA00000034
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	9th ; 2005
会議開催地:	Los Angeles, California, USA
会議開催年:	2005.10.00

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1 国際会議録 SINGLE WAFER WET CLEANING BASED ON SHORT CYCLE TIME, AMBIENT TEMPERATURE AND A SMALL AMOUNT OF CHEMICAL Sano, K.-I., Izumi, A. Electrochemical Society	7 国際会議録 A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES Meuris, M., Verhaverbeke, S., Mertens, P.W., Schmidt, H.F., Rotondaro, A.L.P., Heyns, M.M., Philipossian, A. Electrochemical Society
2 国際会議録 Particle Removal from Micrometer-Sized Trenches Using High-Velocity-Aerosol Cleaning and Comparison with Megasonic Tank Cleaning K.L. Wostyn, K. Sano, A. Eitoku, T. Janssens, T. Bearda Electrochemical Society	8 国際会議録 Surface Photovoltage Characterization of Heavy Metal Contamination and Wafer Cleaning Efficiency in Wet Chemical Processes Rosato, J.J., Hall, R.M., Parry, T.B., Kelly, J.D., Butler, J.N., Jarvis, T.D., Lindquist, P.G. Electrochemical Society
3 国際会議録 EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING Vereecke, G., Holsteyns, F., Veltens, J., Lux, M., Amauts, S., Kenis, K., Vos, R., Mertens, P., Heyns, M. Electrochemical Society	9 国際会議録 EFFICIENT CLEANING OF LOW-к MATERIALS USING SINGLE-WAFER CLEANING SOLUTION: A COMPATIBILITY STUDY AND ELECTRICAL CHARACTERIZATION Q. T. Le, J. Van Olmen, R. Vanderheyden, E. Kesters, K. Kenis, T. Conard, W. Boullart, M. R. Baklanov, S. … Electrochemical Society
4 国際会議録 EFFECTIVE POST-ETCH RESIDUE REMOVAL ON LOW-K FILMS USING SINGLE WAFER PROCESSING Kesters, E., Ghekiere, J., Van Doorne, P., Vereecke, G., Mertens, P.W., Heyns, M.M. Electrochemical Society	10 国際会議録 Quantitative Measurement of Pattern Collapse and Particle Removal Force T. Kim, K.L. Wostyn, P. Mertens, A.A. Busnaina, J. Park Electrochemical Society
5 国際会議録 MECHANISMS OF PARTICLE REMOVAL DURING BRUSH SCRUBBER CLEANING Xu, K., Vos, R., Vereecke, G., Mertens, P., Heyns, M., Vinckier, C., Fransaer, J. Electrochemical Society	11 国際会議録 REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING Fyen, W., Holsteyns, F., Lauerhaas, J., Bearda, T., Mertens, P., Heyns, M. Electrochemical Society
6 国際会議録 Effect of Particle Deposition and Wet/Dry Cleaning Methods on Particle Removal Efficiency T. Kim, S. Hu, A.A. Busnaina, J. Park Electrochemical Society	12 国際会議録 PARTICLE CONTAMINATION DURING WET CLEANING PROCESS ONTO VARIOUS WAFER SURFACES Sakata, Yasuki, Ohnishi, Akihiro, Kishi, Gunji, Izumo, Shouzou, Kondou, Hiroyuki, Tomozawa, Akihiro Electrochemical Society

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