THE EFFECT OF OXYGEN CONCENTRATION IN CLEANING PROCESS ON SILICON SURFACE

THE EFFECT OF OXYGEN CONCENTRATION IN CLEANING PROCESS ON SILICON SURFACE

著者名:

掲載資料名:

Cleaning Technology in Semiconductor Device Manufacturing IX

シリーズ名:

ECS transactions

シリーズ巻号:

1(3)

発行年:

2006

開始ページ:

75

終了ページ:

81

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774291 [1566774292]

言語:

英語

請求記号:

E23400/1-3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047097
シリーズID:	PA00000034
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	9th ; 2005
会議開催地:	Los Angeles, California, USA
会議開催年:	2005.10.00

類似資料:

1 国際会議録 SUPRESSION OF SURFACE MICRO-ROUGHNESS OF SILICON WAFER BY ADDITION OF ALCOHOL INTO ULTRA PURE WATER FOR RINSING PROCESS M. Yamamoto, K. Nii, H. Morinaga, A. Teramoto, T. Ohmi Electrochemical Society	7 国際会議録 EFFECT OF DOPANT CONCENTRATION ON THE GROWTH OF OXYGEN PRECIPITATES IN SILICON Matsumoto, S., Ishihara, I., Kaneko, H., Harada, H., Abe, T. Materials Research Society
2 国際会議録 Revolution of Silicon Substrate Surface Cleaning Ohmi, T. Electrochemical Society	8 国際会議録 Effect of Silicon Surface Orientation on Very Oxide Reliability T. Ohmi, K. Matsumoto, K. Nakamura Electrochemical Society
3 国際会議録 IMPURITIES ON Si SURFACES ELECTROCHEMiCAL DEPOSITION AND REMOVAL OF METALLIC IMPURITIES ON SILICON SURFACES Morinaga, Hitoshi, Ohmi, Tadahiro Electrochemical Society	9 国際会議録 New Measurement Method of Adsorbed Moisture Concentration on Solid Surface Nakagawa, Y., Aomi, H., Takano, J., Ohmi, T. Electrochemical Society
4 国際会議録 BEHAVIOR OF ULTRA FINE METALLIC PARTICLES (-10 inm) ON SILICON WAFER SURFACE Morinaga, H., Futatsuki, T., Ohmi, T., Fuchita, E., Oda, M., Hayashi, C. Electrochemical Society	10 国際会議録 Metal-To-Silicon Contact Formation for Highly Reliable ULSI by Low-Energy Ion Bombardment Process K. Yamada, H. Yamada, N. Konishi, Y. Kawai, T. Ohmi Electrochemical Society
5 国際会議録 Suppression of Surface Micro-Roughness on Si(110) Nii, K., Akahori, H., Yamamoto, M., Teramoto, A., Ohmi, T. Electrochemical Society	11 国際会議録 Megasonic Irradiation-Induced Chemical Reaction in the Solution for Silicon Wafer Cleaning Ohmi, T., Toda, M., Katoh, M., Kawada, K., Morita, H. MRS - Materials Research Society
6 国際会議録 PROPOSAL OF ADVANCED WET CLEANING OF SILICON SURFACE Ohmi, Tadahiro Electrochemical Society	12 国際会議録 COMPARISON OF CLEANING EFFICIENCIES OF NOBEL METALS ON Si SURFACES BETWEEN O3-UPW AND SPM Joo, J.-D., Kim, J.-S., Morita, H., Ohmi, T. Electrochemical Society

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