NANOSCALE PARTICLES REMOVAL ON AN EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL) MASK LAYER BY LASERSHOCK CLEANING | 東京工業大学附属図書館文献データベース

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NANOSCALE PARTICLES REMOVAL ON AN EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL) MASK LAYER BY LASERSHOCK CLEANING

著者名:

さらに 4 件

掲載資料名:

Cleaning Technology in Semiconductor Device Manufacturing IX

シリーズ名:

ECS transactions

シリーズ巻号:

1(3)

発行年:

2006

開始ページ:

26

終了ページ:

32

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774291 [1566774292]

言語:

英語

請求記号:

E23400/1-3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047097
シリーズID:	PA00000034
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	9th ; 2005
会議開催地:	Los Angeles, California, USA
会議開催年:	2005.10.00

類似資料:

1 国際会議録 Nano-particle laser removal from silicon wafers Lee, J.M., Cho, S.H., Kim, T.H., Park, J.-G., Busnaina, A.A. SPIE - The International Society of Optical Engineering	7 国際会議録 Properties of EUVL masks as a function of capping layer and absorber stack structures H. Seo, J. Park, S. Lee, H. Kim, S. Kim, H. Cho SPIE - The International Society of Optical Engineering
2 国際会議録 Effect of Particle Deposition and Wet/Dry Cleaning Methods on Particle Removal Efficiency T. Kim, S. Hu, A.A. Busnaina, J. Park Electrochemical Society	8 国際会議録 NEW APPROACH FOR STUDY OF PARTICLE ADHESION AND REMOVAL RELEVANT TO POST CMP CLEANING Lee, S.-Y., Lee, S.-H., Eom, D.-H., Kim, K.-S., Song, H.-S., Park, J.-G. Electrochemical Society
3 国際会議録 22 nm node contact hole formation in extreme ultra-violet lithography E.-J. Kim, K.-H. Kim, H.-R. Park, J.-Y. Yeo, J.-S. Kim Society of Photo-optical Instrumentation Engineers	9 国際会議録 Masks for extreme ultraviolet lithography Vernon,S.P., Kearney,P.A., Tong,W.M., Prisbrey,S., Larson,C., Moore,C.E., Weber,F.J., Cardinale,G.F., Yan,P., … SPIE - The International Society for Optical Engineering
4 国際会議録 Effect of Additives in Post Cu CMP Cleaning Solutions on Particle Adhesion and Removal Hong, Y.K., Eom, D.H., Lee, S.H., Park, J.G., Busnaina, A.A. Electrochemical Society	10 国際会議録 The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect C. Y. Jeong, B. H. Kim, T. G. Kim, S. Lee, E. J. Kim Society of Photo-optical Instrumentation Engineers
5 国際会議録 Removal process for buffer layer on multilayer of EUVL mask Hoshino,E., Ogawa,T., Takahashi,M., Hoko,H., Yamanashi,H., Hirano,N., Chiba,A., Lee,B.-T., Ito,M., Okazaki,S. SPIE-The International Society for Optical Engineering	11 国際会議録 Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. … SPIE - The International Society of Optical Engineering
6 国際会議録 SUBSTRATE DAMAGE-FREE LASER SHOCK CLEANING OF PARTICLES Park, J.G., Busnaina, A., Lee, J.M., You, S.Y. Electrochemical Society	12 国際会議録 Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks Hau-Riege, S.P., Barty, A., Mirkarimi, P.B., Stearns, D.G., Chapman, H.N., Sweeney, D.W., Clift, W.M., Gullikson, E., … SPIE-The International Society for Optical Engineering

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