Manufacturing of TFTs with High Deposition Rated Microcrystalline Silicon Using Plasma Enhanced Chemical Vapor Deposition

Manufacturing of TFTs with High Deposition Rated Microcrystalline Silicon Using Plasma Enhanced Chemical Vapor Deposition

著者名:

Kyung-Bae Park

掲載資料名:

Amorphous and polycrystalline thin-film silicon science and technology--2007 : symposium held April 9-13, 2007, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

989

発行年:

2007

開始ページ:

399

終了ページ:

404

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558999497 [1558999493]

言語:

英語

請求記号:

M23500/989

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00048532
シリーズID:	PA00000011
会議名:	MRS Spring Meeting
回次:	2007
会議開催地:	San Francisco, California
会議開催年:	2007.04.09-2007.04.13

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