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Progress of NIL template making

著者名:
S. Yusa ( Dai Nippon Printing Co., Ltd. (Japan) )
T. Hiraka ( Dai Nippon Printing Co., Ltd. (Japan) )
A. Kobiki ( Dai Nippon Printing Co., Ltd. (Japan) )
S. Sasaki ( Dai Nippon Printing Co., Ltd. (Japan) )
K. Itoh ( Dai Nippon Printing Co., Ltd. (Japan) )
N. Toyama ( Dai Nippon Printing Co., Ltd. (Japan) )
M. Kurihara ( Dai Nippon Printing Co., Ltd. (Japan) )
H. Mohri ( Dai Nippon Printing Co., Ltd. (Japan) )
N. Hayashi ( Dai Nippon Printing Co., Ltd. (Japan) )
さらに 4 件
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

類似資料:

1 国際会議録 NIL template making and imprint evaluation [6349-85]

Yoshida, Y., Kobiki, A., Hiraka, T., Yusa, S., Sasaki, S., Itoh, K., Toyama, N., Kurihara, M., Mohri, H., Hayashi, N.

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7 国際会議録 Methodology of adhesive energy for photomask fabrication using scanning probe microscopy

S. Shimada, T. Shimomura, K. Yoshida, M. Kurihara, H. Mohri, N. Hayashi

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2 国際会議録 Dry etch technology development for NIL template [6283-87]

Yoshida, Y., Amano, T., Sasaki, S., Itoh, K., Toyama, N., Mohri, H., Hayashi, N.

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8 国際会議録 Optimization of Alt-PSM structure for 100-nm-node ArF lithography: ＩＩ

Mesuda, K., Toyama, N., Narukawa, S., Morikawa, Y., Mohri, H., Hayashi, N., Hoga, M.

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3 国際会議録 UV-NIL template for the 22nm node and beyond

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9 国際会議録 UV NIL template making and imprint evaluation (Third Place Best Poster Award)

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4 国際会議録 Photomask process development for next generation lithography [5853-117]

Sasaki, S., Itoh, K., Fujii, A., Toyama, N., Mohri, H., Hayashi, N.

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10 国際会議録 UV-NIL mask making and imprint evaluation

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5 国際会議録 CD performance of CA-resits with dynamically controlled multizone bake system

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11 国際会議録 Development of bilayered TaSiOx-HTPSM: ？

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6 国際会議録 Development of attenuating PSM shifter for F2 and high-transmission ArF lithography

Nozawa, O., Shiota, Y., Mitsui, H., Suzuki, T., Ohkubo, Y., Ushida, M., Yusa, S., Nishimura, T., Noguchi, K., Sasaki, …

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12 国際会議録 R-mask: a new concept and its application for small-volume production

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