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Robust approach to determine the optimized illumination condition using process window analysis

著者名:
Y. -J. Chun ( Samsung Electronics Co., Ltd. (South Korea) )
S. -W. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
S. Lee ( Synopsys Korea Inc. (South Korea) )
Y. -M. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
S. Suh ( Samsung Electronics Co., Ltd. (South Korea) )
S. -J. Lee ( Samsung Electronics Co., Ltd. (South Korea) )
H. -K. Cho ( Samsung Electronics Co., Ltd. (South Korea) )
H. -J. Park ( Synopsys Korea Inc. (South Korea) )
B. Falch ( Synopsys Korea Inc. (South Korea) )
さらに 4 件
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

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