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The effect between absorber profile and wafer print process window in ArF 6% Att. PSM mask

著者名:
J. Tzeng ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
B. Lee ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
J. Lu ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
M. Kozuma ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
N. Chen ( United Microelectronics Corp. (Taiwan) )
W. K. Lin ( United Microelectronics Corp. (Taiwan) )
A. Chung ( United Microelectronics Corp. (Taiwan) )
Y. C. Houng ( United Microelectronics Corp. (Taiwan) )
C. H. Wei ( United Microelectronics Corp. (Taiwan) )
さらに 4 件
掲載資料名:
Photomask and next-generation lithography mask technology XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6607
発行年:
2007
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819467454 [0819467456]
言語:
英語
請求記号:
P63600/6607
資料種別:
国際会議録

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