Double patterning technology: process-window analysis in a many-dimensional space

Double patterning technology: process-window analysis in a many-dimensional space

著者名:

A. Sezginer ( Invarium, Inc. (USA) )
B. Yenikaya ( Invarium, Inc. (USA) )
W. Staud ( Invarium, Inc. (USA) )

掲載資料名:

Photomask and next-generation lithography mask technology XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6607

発行年:

2007

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819467454 [0819467456]

言語:

英語

請求記号:

P63600/6607

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00046914
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2007 : 14th
会議開催地:	Yokohama, Japan
会議開催年:	2007.04.17-2007.04.19

類似資料:

1 国際会議録 Double patterning technology: process-window analysis in a many-dimensional space A. Sezginer, B. Yenikaya SPIE - The International Society of Optical Engineering	7 国際会議録 Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies T.-B. Chiou, R. Socha, H.-Y. Kang, A. C. Chen, S. Hsu Society of Photo-optical Instrumentation Engineers
2 国際会議録 Sequential PPC and process-window-aware mask. layout synthesis [6156-22] Sezginer, A., Zach F X, Yenikaya B, Carrero J, Hung H T SPIE - The International Society of Optical Engineering	8 国際会議録 Statistical many-dimensional simulation of VLSI technology based on response surface methodology Kazitov,M.V., Kuzmicz,W.B., Nelayev,V.V., Stempitsky,V.R. SPIE - The International Society for Optical Engineering
3 国際会議録 Model-based assist feature generation B. Yenikaya, A. Sezginer SPIE - The International Society of Optical Engineering	9 国際会議録 Development of a new defect sensitivity monitor for advanced OPC reticle technology Staud,W., Eran,Y., Reynolds,P., Sager,C.B. SPIE - The International Society for Optical Engineering
4 国際会議録 A rigorous method to determine printability of a target layout B. Yenikaya, A. Sezginer SPIE - The International Society of Optical Engineering	10 国際会議録 Automatic pitch decomposition for improved process window when printing dense features at keff<0.20 [6283-102] Huckabay, J., Staud, W., Naber, R., Dusa, M., Flagello, D., Socha, R. SPIE - The International Society of Optical Engineering
5 国際会議録 Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36] Huckabay, J., Staud, W., Naber, R., van Oosten, A., Nikolski, P., Hsu, S., Socha, R. J., Dusa, M. V., Flagello, D. SPIE - The International Society of Optical Engineering	11 国際会議録 Halftone PSM inspection sensitivity of OPC line/space pattern for 150-nm generation Wu,C.H., Cheng,J., Wang,D., Wu,C., Eran,Y., Falah,F., Staud,W. SPIE - The International Society for Optical Engineering
6 国際会議録 Optimal segmentation of polygon edges [6156-36] Sezginer, A., Yenikaya, B., Huang, H.-T, Kamat, V., Chen, Y-T. SPIE - The International Society of Optical Engineering	12 国際会議録 Alternative technology for double patterning process simplification H.-Y. Lim, K.-Y. Jang, J.-H. Kim, S.-G. Lee, S. Park Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12